機譯:離子注入和脈沖激光退火制備的鐵磁GaMnP
Helmholtz-Zentrum Dresden-Rossendorf, Inst. of Ion Beam Phys. & Mater. Res., Dresden, Germany;
Curie temperature; Hall effect; III-V semiconductors; Raman spectra; compressive strength; ferromagnetic materials; gallium compounds; hole density; ion implantation; laser beam annealing; magnetic anisotropy; magnetic thin films; magnetoresistance; manganese compounds; pulsed laser deposition; recrystallisation; semiconductor growth; semiconductor thin films; semimagnetic semiconductors; Curie temperature; GaMnP; Mn concentrations; anomalous Hall effect; carrier hole concentration; carrier mediated nature; ferromagnetic material; implanted layer; in-plane compressive strain; in-plane magnetic anisotropy; ion implantation; magnetic properties; microRaman spectroscopy; negative magnetoresistance; pulsed laser annealing; recrystallization; structural properties; transport properties; Annealing; Ion implantation; Magnetic hysteresis; Manganese; Perpendicular magnetic anisotropy; Temperature measurement; Dilute magnetic semiconductors (DMSs); GaMnP; ion implantation; pulsed laser annealing;
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